"Make Your Mark" with TRESemmé and Levo at New York Fashion Week
February 12 • 2:30 - 7pm
Join us at the TRESemmé Runway Studio in the heart of New York Fashion Week to "Make Your Mark" with your own professional presence portrait. Space is limited at this special event, so please only RSVP is you are able to attend.
TRESemmé and Levo are partnering to help women put presence into action in the workplace - giving them the tools to transform how the feel, how they're perceived, and how they preform. To celebrate this exciting partnership, you're invited to an exclusive sneak peek event to meet the leadership from TRESemmé and Levo to learn more about the partnership. Enjoy a cocktail and have your Presence Portrait captured by Jane Houle, renown fashion photographer who has shot from Vogue, a selection of top brands, and backstage at New York Fashion Week.
To help you start your Friday looking and feeling your best, and to ensure that your hair hits the mark, TRESemmé will have a team of professional stylists on hand for all your touch up needs.
**After you RSVP, send an email to TRESNYFW@edelman.com with the subject 'Make Your Mark' and your contact details to book your Presence Portrait!**